Leskelä, Markku: Finnish CoE in Atomic Layer Deposition (ALD)

The CoE is committed to chemistry research and development, with special focus on the manufacture of ultra-thin films using the Atomic Layer Deposition (ALD) method. Major applications for ALD films are found in the field of microelectronics, nanotechnology and the energy sector.

The CoE comprises the Thin film Group at the University of Helsinki Laboratory of Inorganic Chemistry; the Materials Physics Division at the University of Helsinki Department of Physics; and VTT Microsystems and Nanoelectronics. Each team has its own primary area of expertise and its own tasks. The CoE is extensively networked both nationally and internationally, and works closely with industrial partners.

The aim is to develop new ALD processes for materials that are used in various microelectronics components, such as memories and microelectromechanical systems (MEMS), nanostructure solar panels and lithium-ion batteries and various optical and optoelectronic components.

The CoE has a world-leading position in the development of ALD processes. This has been achieved with long and pioneering research. The added value of the CoE originates from a unique combination of excellence in the fields of chemistry, physics and electronics.

More information

Professor Markku Leskelä
University of Helsinki
tel. +358 9 191 50195

Sites of research: University of Helsinki, VTT Technical Research Centre of Finland

Last modified 18 Feb 2015
Connect with us
Facebook Slideshare Twitter Youtube
SWITCHBOARD +358 295 335 000
REGISTRY +358 295 335 049
FAX +358 295 335 299
OFFICE HOURS Mon–Fri 8.00–16.15